锻压技术

热轧变形量对半导体用NiCr溅射靶组织和磁性能的影响

英文标题：Influence of hot rolling deformation on microstructure and magnetic properties of NiCr sputtering target for semiconductor

作者：郭美丽

单位：河南工业贸易职业学院信息工程学院

关键词：NiCr溅射靶热轧变形量位错微观组织磁性能

分类号：TG335

出版年,卷(期):页码：2021,46(3):162-166

摘要：

分析了半导体用NiCr溅射靶受到热轧作用后发生的组织与磁性能的变化，研究了不同的NiCr合金显微组织结构对其磁性产生的影响及两者间的相互作用。研究结果表明：在NiCr合金中存在大量FCC晶单相镍基固溶体，逐渐增大热轧变形量后，其形成了宽度更大的衍射峰。当热轧变形量提高后，(100)晶面发生了择优取向，取向度先增大、再降低，其余晶面保持取向度基本不变。在热轧前，NiCr合金基体内未形成位错，对各热轧组织进行BSE表征测试，均表明NiCr合金中形成了更细小的晶粒。在磁滞回线中心区域，经过热轧处理后，形成了更多的磁滞回线封闭区，矫顽力与剩余磁感应强度显著增强。热轧阶段形成了恒定的饱和磁感应强度，提高热轧变形程度后，合金获得了更大的矫顽力。

The changes of microstructure and magnetic properties of NiCr sputtering targets for semiconductor after hot rolling were analyzed, and the influences of different microstructures for NiCr alloys on their magnetic properties and the interaction between them were studied. The results show that there are many FCC single-phase nickel-based solid solutions in NiCr alloy, and the diffraction peaks with larger width are formed after the deformation amount of hot rolling is gradually increased. When the deformation amount of hot rolling increases, the preferred orientation of crystal surface (100) first increases and then decreases, while the orientation of other crystal surfaces remains basically unchanged. Before hot rolling, without dislocation is formed in NiCr alloy matrix, and the BSE characterization test of each hot rolling structure indicates that finer grains are formed in NiCr alloy. In the central region of hysteresis loop, more closed areas of hysteresis loop are formed after hot rolling treatment, and the coercivity and residual magnetic induction intensity are significantly enhanced. Thus, at the hot rolling stage, a constant saturation magnetic induction intensity is formed, and the alloy gains greater coercivity after increasing the deformation degree of hot rolling.

基金项目：

河南省科技厅重大项目(162102310068)

郭美丽（1981-），女，学士，副教授 E-mail：guomeili126@126.com

参考文献：

[1]Pagès X, Binder R, Vanormelingen K, et al.The effect of the second annealing step on the Ni1-xCrx:Si film thermal stability[J].Microelectronic Engineering, 2017, 171(8): 44-52.

[2]Rao K V, Khaja F A, Ni C N, et al.NMOS contact resistivity reduction with implants into silicides[J].Physica Status Solidi, 2014, 11(1): 174-177.

[3]Demeulemeester J, Smeets D, Comrie C M, et al.On the growth kinetics of Ni(Cr) silicide thin films[J].Journal of Applied Physics, 2013, 113(16): 1-8.

[4]王一晴, 郭俊梅, 管伟明, 等.镍铬溅射靶在半导体制造中的应用及发展趋势[J].贵金属, 2016, 37(3): 87-92.

Wang Y Q, Guo J M, Guan W M, et al.Application and development trend of Nickel-chromium sputtering target in semiconductor manufacturing [J].Precious Metals, 2016, 37(3): 87-92.

[5]杨长胜, 程海峰, 唐耿平, 等.磁控溅射铁磁性靶材的研究进展[J].真空科学与技术学报,2005, 25(5): 372-377.

Yang C S, Cheng H F, Tang G P, et al.Research progress of magnetron sputtering ferromagnetic target [J].Journal of Vacuum Science and Technology,2005, 25(5): 372-377.

[6]Sarkar J.Ferromagnetic sputtering targets and thin films for silicides and data storage[J].Sputtering Materials for VLSI & Thin Film Devices, 2014: 501-565.

[7]Wang X, Harris H R, Bouldin K, et al.Structural properties of fluorinated amorphous carbon films[J].J.Appl.Phys., 2000, 87(1): 621-623.

[8]Perry A C, Koenigsmann H J, Dombrowski D E, et al.High-purity ferromagnetic sputter targets and method of manufacture[P].US: US2004/0031546A1, 2009-11-19.

[9]王传军, 谭志龙, 张俊敏, 等.一种镍铂溅射靶及其制备方法[P].中国: CN201410231799.5, 2016-08-24.

Wang C J, Tan Z L, Zhang J M, et al.A nickel-chromium sputtering target and its preparation method[P].China: 202010725031, 2014-09-23.

[10]Ni D W, Zhang G J, Kan Y M, et al.Highly textured ZrB2-based ultrahigh temperature ceramics via strong magnetic field alignment[J].Scripta Materialia, 2009, 60(8): 615-618.

[11]左锦荣, 侯陇刚, 史金涛, 等.两阶段轧制变形过程中高强铝合金析出相与晶粒结构演变及其对性能的影响[J].金属学报, 2016, 52(9): 1105-1114.

Zuo J R, Hou L G, Shi J T, et al.Precipitation phase and grain structure evolution of high strength aluminum alloys during two-stage rolling deformation and their effects on properties [J].Acta Metallurgica Sinica, 2016, 52(9): 1105-1114.

[12]Wen M, Liu G, Gu J F, et al.Dislocation evolution in titanium during surface severe plastic deformation[J].Applied Surface Science, 2009，255(12): 6097-6102.

服务与反馈：

【文章下载】【加入收藏】