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电子屏蔽罩支架平面度超差原因分析及控制
英文标题:Cause analysis and control on flatness out of tolerance for electronic shield bracket
作者:张金梁 曹建国 邵长伟 杜磊 武欢 代先东 
单位:四川大学 机械工程学院 长江机械有限公司 
关键词:屏蔽罩支架 平面度 回弹 翘曲 精冲 
分类号:TG355.83
出版年,卷(期):页码:2022,47(11):109-115
摘要:

屏蔽罩支架是屏蔽罩的重要组成部分,为解决屏蔽罩支架产品的平面度超差问题,对其产生原因和工艺优化进行了分析。首先,采用数值模拟技术,探讨了顶料力、压边及压边力和板料工艺结构等因素对屏蔽罩支架成形质量的影响,结果表明,增大顶料力、添加压边圈并全拉深、增加压边力、改进工艺结构有利于抑制该薄板冲压件的翘曲倾向。然后,根据影响因素设计了优化方案并最终通过实物实验,发现在精冲结束后增加一道过压量为0.01 mm的过压整形工序,以及更改引伸工序前面板料工艺结构为C型的优化方案有利于抑制翘曲,同时采用两种优化方案可以将平面度从0.6~0.8 mm减小至0.3~0.5 mm。

The shield bracket is an important part of shield. In order to solve the problem of product flatness out of tolerance for shield bracket, the causes and process optimization were analyzed. Firstly, the influences of ejection force, blank holder, blank holder force and sheet process structure on the forming quality of shield bracket were discussed by numerical simulation. The results show that increasing the ejection force, adding the blank holder and full deep drawing, increasing the blank holder force and improving the process structure were beneficial to restrain the warpage tendency of sheet stamping part. Then, according to the influence factors, an optimized scheme was designed, and the actual experiment was finally passed. In the addition, it is found that adding an overpressure shaping process with an overpressure amount of 0.01 mm after the fine blanking and changing the sheet metal process structure before the drawing process to a C-type are beneficial to restrain the warpage. At the same time, the two optimization schemes are adopted at the same time can reduce the flatness from 0.6-0.8 mm to 0.3-0.5 mm.  

基金项目:
四川大学-泸州市人民政府战略合作科技创新研发项目(2021CDLZ-3)
作者简介:
作者简介:张金梁(1997-),男,硕士研究生,E-mail:1109186228@qq.com;通信作者:曹建国(1971-),男,博士,副教授,E-mail:cjgkl@sina.com
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